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Index of Materials - Compound - Sputtering-Targets

Compound

Goodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate despatch. Please contact us with details of your requirements.

Sputtering Target

A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
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Aluminum Nitride
Barium Titanate
Bismuth Ferrite
Calcium Fluoride
Cobalt (II) Oxide
 
Hafnium Oxide
Indium Oxide
Indium Oxide/Tin Oxide
Lithium Cobalt Oxide
Lithium Lanthanum Zirconium Oxide
 
Lithium Manganese Oxide
Lithium Nickel Manganese Oxide
Lithium Orthosilicate
Lithium Phosphate
Magnesium Oxide
 
Molybdenum Disilicide
Nickel Oxide
Samarium ferrite
Tantalum Pentoxide
Tin Oxide
 
Titanium Boride
Titanium Nitride
Tungsten Silicide
Tungsten Trioxide
Zinc Oxide
 
Zinc Oxide / Gallium Oxide 2% - GZO
Zirconium Nitride
 

Click here to search our on-line Catalog for items matching - Compound - Sputtering-Targets

 
See also Films   Foils   Sheets  

Index