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Index of Materials - Ceramic - Sputtering-Targets

Ceramic

Ceramics are non-metallic, non-organic materials.

They exhibit excellent resistance to high temperatures. Although they have comparatively low densities, they are extremely hard but tend to be brittle. They show good resistance to both abrasives and chemicals.

Sputtering Target

A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
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Alumina
Alumina
Boron Carbide - Hot-pressed
Boron Nitride
Lanthanum manganite
 
Lead titanate
Lithium titanium oxide
Quartz - Fused
Silicon Carbide - Hot-pressed
Silicon Nitride - Hot-pressed
 
Titanium Diboride
Titanium Dioxide
Tungsten Carbide/Cobalt
Yttrium ferrite
Zinc Oxide/Aluminium Oxide
 
Zinc Oxide/Aluminium Oxide
Zinc Oxide/Aluminum Oxide
Zirconia - stabilized with Yttria
 

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See also Films   Foils   Sheets  

Index